Applied Materials HP Centura PVD Cluster Tool, 2ea PVD process chamber+PreccleanII, Cooling, Degas Oreinter, w/ control cabinet w/ Leybold Harris & CTI controllers, AMAT shield treatment controller, KSI shield treatment supply, Advanced Energy MDX-L6 RF supply, Advanced Energy MDX-L12M RF supply, RFPP LF10A RF supply, Comdel CPS1001S RF supply; power control cabinet, 208V, 50/60Hz, 144kW. Mfg 1994. Includes: 1ea BOC Edwards QDP40 vacuum pump; 1e BOC Edwards QDP40 vacuum pump w/ QMB250 booster; 1ea CTI-Cryogenics 9600 compressor; 1ea Neslab recirculating chiller.